CVD SEMI systems
To maintain the march of Moore's Law, the feature sizes of the transistors in silicon ICs must get smaller and
smaller. Maintaining performance at these incredibly small scales demands the introduction of very-high quality,
ultra-thin films of new materials.
Traditional silicon foundry tools are incapable of depositing such films, which can be formed with sufficiently
high quality using ultra-low-pressure chemical vapor deposition. Riber is a pioneer of this growth technology,
and in 2009 it launched a plug-and-play thin-film evaporation system for integrating into the world's leading
300 mm silicon production tools.