The SIVA 21 is specially designed for silicon and silicon germanium film growth.
This machine shares the versatility, cost-competitiveness and ergonomic design of the Compact 21 series.
However, it has been tailored to the growth of silicon-based films through the addition of a high-capacity
electron-beam for heating four source ports, and a high-temperature substrate heater.
For more information, please contact Riber.
- Up to 3"
- Two large Eguns
- Four large cell/source ports