Gas Distribution Systems & Gas Injectors  Gas panel assembly in clean room Long-term success in wafer processing implies the mastery of deposition techniques capable of producing layered struc-tures controlled down to the atomic monolayer range, with a contamination level smaller than 10-ppb in order to eliminate dark and leakage currents created by heavy metal contamination. These technologies are characterized by perfectly controlled gas flow patterns, the elimination of particle and impurity molecule adsorption on the substrate surface, low temperatures in order to avoid relaxation and maintain compact doping profiles, high selectivity, complete uniformity and a perfectly clean process environment. Responding to this need, RIBER introduced in 1990 gas distribution systems with features designed to meet the highest specifications of the industry. These products give the end-user safe, precise, and reliable solutions to semiconductor gas handling problems by combining advantages of high-purity gas panel technology with high-resolution flow control systems and real contamination-free valved gas injectors. In-house expertise and years of cooperation with major research groups focused on providing the ultimate process and support, have resulted in a versatile and cost-effective product range.    To find out more on Riber high-purity gas distribution systems    To find out more on Riber valved gas injectors