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EZ-REF – Real-time reflectivity measurement

EZ-Ref – in situ Real-time MBE GROWTH MONITORING

Main benefits

  • Real-time measurement
  • In situ : at the wafer surface, during the growth, under vacuum
  • Determine growth rate and optical properties of your layers
  • Genuinely multispectral : adress complex structures
  • Seamless coupling with EZ-Instruments from Riber

Key features

Parameter Specifications
Spectral Range From 320 nm to 1700 nm
Stability Better than 1% variation over 40h (measured at 500 and 980 nm)
Reflectance Noise Lower than 0.5%
Measurement Frenquency Practical – in the 10 to 100 Hz range (Theoretical – up to 1000 Hz)
Growth rate Accuracy Better than 1% (after 100 nm growth typ.)
Source lifetime 1000 h
Rotation speed range 0-60 rpm typ.
Viewport to sample distance Adjustable – From 75 mm – depending on vacuum chamber dimensions
Flexible installation angle on the reactor 0 (normal incidence) to 70°

Software

  • Spectral reflectance chronograms display
  • Cursors : wavelength over time or complete spectrum at a given moment
  • Growth rate calculation module
  • Advanced modules: Special VCSELs module – follow the Fabry Perot dip, stopband center and width / Optimal wavelength selection for optical structures monitoring
  • Intuitive data acquisition
  • Powerful data saving functions – .tsms, .csv, decimated, merged, single or multi-wavelengths,…
  • “Real time” mode – up to 100 Hz
  • Flexibility to share live data with other software incl. Riber Crystal XE
  • Post-processing and data treatment
  • Remote modbus interface

References

Find out more about EZ-REF here :

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