Nitride resistant high temperature heater

Tailored for Nitrides

Details

  • Process temperatures higher than 1100°C at substrate
  • Long life in corrosive environment
  • Thermal uniformity: at wafer < 1%
  • Thermal flash compatible
  • Ramp rates up to 200°C/minute
  • Filament material and heater structure resisting high thermal constraints
  • Retrofit compatibility
  • No change of customer power supplies

Presentation

Riber provides a heater model for both research and production, compatible with nitrogen environment such as N, N2, NH3, etc.

Its design allows choosing the right filament technology regarding the application and environment used.

The Riber high temperature and N resistant heaters are dedicated to process temperatures higher than 1100°C for a substrate.

Technical information

Characteristics ARM 2″ – ARM 3″ – PSCT 2″ – PSCT 4″ – PCST 6″
Filament Single
Heating filament G-Pur
Thermocouple C-type
Typical operating temperature 1250°C
Maximum continuous operating temperature 1500°C
Maximum outgassing temperature 1600°C
Temperature stability +/- 0.2°C

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