Oxygen resistant high temperature heater

Tailored for Oxides

Details

  • Process temperatures higher than 1100°C at substrate
  • Long life in corrosive environment
  • Thermal uniformity: at wafer < 1%
  • Thermal flash compatible
  • Ramp rates up to 200°C/minute
  • Filament material and heater structure resisting high thermal constraints
  • Retrofit compatibility
  • No change of customer power supplies

Presentation

Riber provides a heater model for both research and production, compatible with oxide environment such as O, O2, O3, NO2, N2O, etc.

Its design has demonstrated excellent performance in reactors with a high base pressure of oxygen. Its design allows choosing the right filament technology regarding the application and environment used.

The Riber high temperature and O2 resistant heaters are dedicated to process temperatures higher than 1100°C for a substrate.

Technical information

Characteristics ARM 2″ – ARM 3″ – PSCT 2″ – PSCT 4″ – PCST 6″
UHTOXY
Filament Single
Heating filament gSIC
Thermocouple C-type
Typical operating temperature 1100°C
Maximum continuous operating temperature 1200°C
Maximum outgassing temperature 1300°C
Temperature stability +/- 0.2°C

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