Substrate Heaters

Details

  • Operating temperatures up to 800°C
  • High thermal efficiency
  • Top quality materials – contamination free
  • Oxygen-resistant version available

Presentation

Riber substrate heaters are highly thermally efficient. The filament design provides excellent thermal radiation among the substrates.

The filament assembly features a consistent serpentine pattern providing uniform heating to temperatures up to 1000°C – or higher for Nitride or Oxide applications.

Production system substrate heater consists of one or two wire tantalum windings. The winding density varies to provide constant radiation over a very large surface area.
The filaments are independently heated and controlled to optimize temperature adjustment, countering effects of the edge of the substrate holder, and lowering power consumption.
Each filament can be regulated by its own thermocouple.

To improve thermal efficiency, tantalum shielding covers the mechanical and the electrical parts so that no damage to material occurs.

Clean operation is achieved by carefully selecting the construction materials. Only tantalum, molybdenum are used in hot zones.

All substrate heaters are designed to minimize induced magnetic fields, for improved RHEED performances.

Riber can provide a heater model for both research and production, compatible with oxide environments. Its design has demonstrated excellent performances and lifetime in reactors with a high base pressure of oxygen.

For more information about the results, please ask for our application notes and detailed system presentations.

Technical information

Type of oven / Compatibility PSCT 3″ PSCT 4″ PSCT 6″ PSCT D350 PSCT D500
Standard Ta flat filament, PBN encapsulated

800°C (T/C)

Ta flat filament, PBN encapsulated

800°C (T/C)

Ta spring filament
800°C (T/C)
Ta spring dual filament
800°C (T/C)
Ta spring dual filament
800°C (T/C)
High temperature oven Consult Riber Ta flat filament, open design PBN plate
1100°C (T/C)
Consult Riber Consult Riber Consult Riber


Example of temperature uniformity obtained on 9×4″ – MBE6000
Standard oven, Si substrates, uniformity rings optimized

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