Substrate Manipulators ARM


  • Field-proven equipment for horizontal geometry
  • Reliable and rugged design
  • Continuous rotation up to 40 rpm typical
  • Efficient shielding to prevent from material contamination
  • Exists for 2″ or 3″ substrate size
  • Adaptable to fit MBE2300, MBE32 and Compact 21 TM series


The ARM substrate holder models are positioned on a horizontal port and allows for a continuous rotation at up to 40 rpm.

Rotation is performed using a magnetically coupled motor. The ARM includes additional X, Y, Z motions for further versatility, e.g. RHEED oscillation for which it allows to adjust the main axis location with precision micrometers.

A flux gauge is directly mounted on the back of the manipulator which allows precise measurement of the flux at the exact position of the platen.
During flux gauge calibration, the substrate is protected from stray depositions.
On the contrary, during growth, the flux gauge is protected from the flux.

The ARM series fits on MBE32 systems and also on Compact 21 TM series,
This compatibility enables the use of the manipulator onto vertical-design machines to adapt from MBE32 legacy design to modernized Compact 21 chambers.
Then it can then be kept when upgrading a chamber from MBE32 to Compact 21 – higher cells filling capabilities, larger and more cells ports.

It exists as 2″ or 3″ to accommodate variety of ovens and address different applications from 10 x 10mm up to 3″ wafers.

RIBER - Substrate Manipulators ARM


Technical information

Characteristics ARM 2″ ARM 3″
MBE system of choice MBE 32 MBE 32 / Compact 21 TM
Substrate heater size* 2″ 3″
Double filament oven No
Molybloc size 2″ 4″
Mounting flange CF200
Typical rotation speed 0-40 RPM
Max operation/ outgassing temperature (heater dependent)* 800°C /1000°C
Main shutteravailable No

*Please consult substrate heater section for more details

For special configurations (temperature range, type of T/C, in contact or not, optical access, …), please consult Riber

Component interfacing

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