VRF Plasma V-SG-700 for Se/S
ENABLING ADVANCED CIGS TECHNOLOGY
- 700cc nominal loading capacity
- Flow controlled by a high conductance valve
- Flow rate up to 0.5 g/min
- Efficient Plasma cracking of polymeric like molecules
The V-S/G-RF 700 is a source producing either selenium or sulfur vapor, cracked by a Plasma.
The material is loaded into a heated reservoir delivering a vapor composed of polymeric species, such as Se6, Se5, Se7, Se2.
These species are then injected into an RF plasma cracking zone where lower indices of species are produced.
A valve is inserted between the reservoir and the plasma cracking zone which allows for tuning, thereby control the active species injected into the process chamber.