VRF Plasma V-SG-700 for Se/S

ENABLING ADVANCED CIGS TECHNOLOGY

Details

  • 700cc nominal loading capacity
  • Flow controlled by a high conductance valve
  • Flow rate up to 0.5 g/min
  • Efficient Plasma cracking of polymeric like molecules

Presentation

The V-S/G-RF 700 is a source producing either selenium or sulfur vapor, cracked by a Plasma.

The material is loaded into a heated reservoir delivering a vapor composed of polymeric species, such as Se6, Se5, Se7, Se2.

These species are then injected into an RF plasma cracking zone where lower indices of species are produced.

A valve is inserted between the reservoir and the plasma cracking zone which allows for tuning, thereby control the active species injected into the process chamber.

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